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ECE 541 - Microelectronic Fabrication Techniques

Description: Credit 4. Current fabrication techniques of microelectronic technology; plasma and CVD processes; etching techniques; ion implantation; surface analytical methods.

Prerequisite: ECE 347 or ECE 449

Topics:

  • Plasma Techniques
  • CVD Processes
  • Etching Techniques
  • ION Implanation
  • Surface Analytical Methods
  • Current Processing Methods
Topic revision: r2 - 2011-03-08 - 19:16:41 - Main.ala
 
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